CIRP global conference held in Huddersfield
Fri, 20 Apr 2012 11:13:00 BST
CIRP Experts in computer-aided tolerancing come from the UK and 13 countries overseas
Pictured with CIRP conference organiser Professor Jane Jiang (centre), Director of the University's EPSRC Centre for Innovative Manufacturing, are keynote speakers (l-r) Professor David Whitehouse, Professor Vijay Srinivasan, Dr Henrik S. Nielson, Professor Albert Weckenmann and Professor Luc Mathieu.
MORE than 90 of the world’s leading experts in an important field of metrology attended a two-day conference at the University of Huddersfield. They came from the UK and 13 overseas countries.
It was the 12th biennial CIRP Conference on Computer Aided Tolerancing and the first time it had taken place in the UK. Delegates heard and presented 70 papers and there were keynote addresses from eminent experts who included Professor David Whitehouse, who is regarded as the world authority on surface and nanometrology.
The University of Huddersfield is a leading centre for metrology research and the CIRP Conference was jointly hosted by its EPSRC Centre for Innovative Manufacturing in Advanced Metrology.
The University’s Professor Jane Jiang, who is Director of the EPSRC Centre is a Fellow of CIRP – which is the French acronym for International Academy for Production Engineering – and she chaired the two-day conference, which she was instrumental in bringing to Huddersfield. Joining her on the local organising committee were two University colleagues, Professor Liam Blunt and Professor Paul Scott.
The keynote addresses were by Professor Albert Weckenmann, of the University of Erlangen-Nuremberg; Dr Vijay Srinvasan, of the USA’s National Institute of Standards and Technology; Dr Henrik S. Nielsen, who chairs a technical committee of the International Organisation for Standardisation; and Professor Whitehouse, who is an Emeritus Professor of the University of Warwick, holder of a lifetime award from the UK’s National Physical Laboratory and dubbed the “father of digital metrology” by the American Society of Precision Engineers. His keynote address was entitled ‘General Metrology in Manufacture’.
The stated aim of the conference was to provide an international forum for academics, professionals and engineers from different disciplines to meet and exchange their ideas, results and latest research. Also, users could describe their practical experiences and give new challenges for the development of product design and metrology.
Organisers ensured a balance between delegates from the academic world and from industry. Overseas nations represented included Canada, India, Germany, the USA, France, Germany, Italy, Sweden, Denmark, Poland and China.
In addition to the large number of papers, there were also poster presentations which outlined recent research.
